Papers
>2019
>2018
>2017
Borland IWJT-2017 Paper
44 PVSC-Borland paper #832
>2016
Borland JSPS Nov 2016
Borland Invited Oct 2016 ECS
Borland IIT-2016 Sn Implant paper
Borland IIT-2016 High & Low Dose
>2015
Borland Oct 2015 ECS invited paper
Borland IWJT-2015 Paper
>2014
IIT-2014 Doping in Si & Ge paper
Oct 2014 ECS Ge-implant LPE paper
>2013
IWJT-2013 Ge-channel formation
IWJT-2013 In & Ga HALO
>2012
IWJT-2012 Ga,C+Ga,In,In+BF2,BF2 HALOs.pdf
IIT-2012 Ga-HALO.pdf
IEEE-PVSC 2012 Solar Selective Emitter furnace vs implant.pdf
EU-PVSEC 2012 Selective Emitter.pdf
>2011
>2010
iit-2010-p-usj-paper.pdf
rtp-2010-pusj-paper.pdf
rtp-2010-spe-and-lpe-n-usj-paper.pdf
2009
IEEE-RTP 2009 n+SiCP paper
IEEE-RTP 2009 B36 p+ USJ
Aug 2009 SST USJ paper
Insights 2009 p+ USJ
Insights 2009 High Tilt Implant
2008
iwjt-2008-borland.pdf
july-2008-sst-paper.pdf
iit-2008-job-dns-paper.pdf
jan-2008-sst-paper.pdf
2007
2007-march-semiconductor-international-web-paper.pdf
2007-may-insights.pdf
2007-june-iwjt-job.pdf
2007-june-iwjt-job-nec.pdf
2007-june-iwjt-job-selete.pdf
2007-june-high-k-metal-gate-vlsi-sym-2007.pdf
2007-june-wafernews.pdf
2007-oct-rtp-borland.doc
2006
Dec Semiconductor International
2005
Jan Semiconductor International
2004
May Solid State Technology Epion
August Solid State Technology SSM
Nov SST Asia Supplement Imager DSG
2003
April Semiconductor International
2002
2001
April Semiconductor International
Other key past papers
1983 May ECS IG Activation Bulk & Epi
1984 August Solid State Technology Epi Latch-up
1985 August Solid State Technology Device Isolation & SEG
1985 ECS N-wafer IG Twin Well CMOS
1989 April Semiconductor International Intrinsic Gettering
1989 May Semicoductor International Intrinsic Gettering
1991-wet-dry-ex-situ-in-situ-cleaning.pdf
1993-ecs-selective-etching-of-native-oxide.pdf
1993-ssdm-selective-native-oxide-etching.pdf
1993-ecs-cvd-xii-multi-chamber-epi.pdf
1996 June Solid State Technology MeV Epi Replacement